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1706篇 您的检索式：期刊名="J Vac Sci Technol"

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	题名	作者	年代	出处	被引量
1	显示文摘	ChenKT ShiDT Chen H	1997	J Vac Sci Technol A1997，15，3：	2
2	Field emission characteristics of boron nitride films deposited on Si substrates with cubic boron nitride crystal grains 显示文摘	Kimura C Yamamoto T Sugino T	2001	J Vac Sci Technol B2001，19，：	2
3	Mircroradiographic characterization of metal and polymer coated microspheres显示文摘	Singleton R M Weir J T	1981	J Vac Sci Technol1981，18，3：	2
4	Polysilicon thin film transistors fabricated on low temperature plastic substrates显示文摘	Carey P Smith P Theiss D	1999	J Vac Sci Technol A1999，17，：	1
5	TiN film coatings on alumina radio frequency windows显示文摘	Michizono S Kinbara A Saito Y	1992	J Vac Sci Technol1992，10，4：	1
6	Advanced time-multiplexed plasma etching of high aspect ratio silicon structures 显示文摘	M A Blauw G Craciun W G Sloof	2002	J Vac Sci Technol2002，20，6：	1
7	Nanoscale Layer Removal of Metal Surface by Scanning Probe Microscope Scratching 显示文摘	Sumancgi T Endo T Kuwabam K	1995	J Vac Sci Technol1995，13，3：	1
8	GaN, AlN, and InN: A review显示文摘	Strite S Morko H	1992	J Vac Sci Technol1992，10，4：	1
9	Auger and photoelection line energy erlation ships in aluminum-oxygen and Silicon-oxygen compounds显示文摘	Wagner C D Passoja D E Hillery H F	1982	J Vac Sci Technol1982，21，：	1
10	Gas-phase production of carbon single-walled nanotubes from carbon monoxide via Hipco process:a parametric study显示文摘	Michael J Bronikowski Peter A Willis Daniel T Colbert	2001	J Vac Sci Technol2001，19，4：	1
11	Developments in broad beam ion source technology and applications显示文摘	Harper J M E Cuomo J J	1983	J Vac Sci Technol A1983，1，2：	1
12	Mask fabrication for projection electron- beam lithography incor-porating the SCALPEL technique显示文摘	J A Liddle H A Huggins S D Berger	1991	J Vac Sci Technol1991，9，6：	1
13	Fabrication of high-reflectance Mo-Si multilayer mirrors by planar-magnetron sputtering显示文摘	Stearns D G Rosen R S Vernon S P	1991	J Vac Sci Technol1991，9，：	1
14	Lithography using ultrathin resist films显示文摘	See E G Pike C Bell S	2000	U J Vac Sci Technol B2000，18，：	1
15	Particle bombardment effects on thin film de- position: A review显示文摘	Mattox D M	1989	J Vac Sci Technol1989，17，3：	1
16	Compensation methods for buried defects in extreme ultraviolet lithography masks显示文摘	C H Clifford T T Chan A R Neureuther	2011	J Vac Sci Technol B2011，29，01：	1
17	Measurement of Schottky barrier height tuning using dielectric dipole insertion method at metal-semiconductor interfaces by photoelectron spectroscopy and electrical characterization techniques显示文摘	COSS B E SIVASUBRAMANI P BRENNAN B	2013	J Vac Sci Technol B:Microelectron Nanometer Struct2013，31，02：	1
18	Properties of Co -deposited indium tin oxide and zinc oxide films using a bipolar pulse power supply and a dual magnetron sputter source 显示文摘	Hwang M S Jeong H S Kim W M	2003	J Vac Sci Technol A2003，21，4：	1
19	Ultrasmooth plasma polymerized coatings for laser fusion targets显示文摘	LETTS S A MYERS D W WITT L A	1981	J Vac Sci Technol1981，19，3：	1
20	Hafnium dioxide etch stop layer for phase shifting masks显示文摘	Shih K K Chieu T C Dove D B	1993	J Vac Sci Technol B1993，11，6：	1

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