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Structure and microtribological characteristics of laser-arc deposited TiB_2 thin film

查看全文 作  者:CAO Xiankun, SHAO Tianmin, WEN Shizhu, QING Tao & QI FengState Key Laboratory of Tribology, Tsinghua University, Beijing 100084, China;The College of Mechanical & Electronic Engineering, WHUT, Wuhan 430070, China 高影响力作者 出  处:《Science China(Physics,Mechanics & Astronomy)》索引2004年第47卷第z1期,共7页高影响力期刊 基  金:This work was supported by the National Natural Science Foundation of China(Grant No.50135040). 摘  要:TiB2 thin film was deposited by laser-arc deposition method on the surface of single crystalline silicon. The morphology, composition, structure and microtribological properties of the film were studied by using XPS, XRD and atomic force/friction force microscope (AFM/FFM). The results show that TiB2 (100) preferred growth on the Si(100)substrate, TiB2(001) preferred growth on the Si(111) substrate. The TiB2 thin film was composed of TiB2 and a small amount of TiO2. The friction coefficient of TiB2 film on substrates Si (100) and Si(111) in microtribological process were 0.087 and 0.073,respectively. TiB2 thin film displayed distinct ability of anti-scratch and wear-resistance. 关 键 词:TIB2 thin film, structure, microtribology, AFM, FFM.
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