XPS Studies of Magnetic Multilayers

查看全文 作　　者：Guanghua Yu, Hongchen Zhao, Jiao Teng, Chunlin Chai, Fengwu Zhu, Yang Xia, Shumin Chai Material Science and Engineering School, University of Science and Technology Beijing, Beijing 100083, China Microelectronics Center, Chinese Academy of Science, Beijin 出　　处：《Journal of University of Science and Technology Beijing》索引2001年第8卷第3期,共4页 基　　金：the National Natural Science Foundation of China under Grant No. 19890310.] 摘　　要：NiOx/N81Fe19 and Co/AlOx/Co magnetic multilayers were fabricated by reactive RF/DC magnetron sputtering on clean glass substrates and oxidized Si (100) substrates, respectively. The exchange biasing field (Hex) between NiOx, and Ni81Fe19 as a function of NiOx, oxidation states was studied by X-ray photoelectron spectroscopy (XPS). The oxidation states and the oxide thickness of Al layers in magnetic multilayer films consisting of Co/AlOx/Co were also analyzed. It is found that the Hex of NiOx/Ni81Fe19 films only depends on Ni2+ but not on Ni3+ or Ni. The bottom Co can be completely covered by depositing an Al layer thicker than 2.0 nm. The oxide layer was Al2O3, and its thickness was 1.15 nm. 关 键 词：NiO_x exchange biasing field Hex AlO_x X-ray photoelectron spectroscopy (XPS)