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THE BAND STRUCTURE AND WORK FUNCTION OF TRANSPARENT CONDUCTING ALUMINUM AND MANGANESE CO-DOPED ZINC OXIDE FILMS

查看全文 作  者:[1]H.T.Cao;[1]Z.L.Pei;[1]X.B.Zhang;[2]J.Gong;[2]C.Sun;[1]L.S.Wen 高影响力作者 机构地区:[1]DivisionofSurfaceEngineeringofMaterials,InstituteofMetalResearch,TheChineseAcademyofSciences,Shenyang110016,China;[2]DivisionofSurfaceEngineeringofMaterials,InstituteofMetalResearch,TheChineseAcademyofSciences,Shenyang110016,China//ShenyangResearchCenterforInterfacialMaterials,Shenyang110016,China高影响力机构 出  处:《Acta Metallurgica Sinica(English Letters)》索引2005年第18卷第3期,共7页高影响力期刊 基  金:This work was supported by the National Nalural Science Foundation of China(No.50172051). 摘  要:Al and Mn co-doped-ZnO films have been prepared at room temperature by DC reacti ve magnetron sputtering technique. The optical absorption coefficient, apparent and fundamental band gap, and work function of the films have been investigated using optical spectroscopy, band structure analyses and ultraviolet photoelectro n spectroscopy (UPS). ZnO films have direct allowed transition band structure, w hich has been confirmed by the character of the optical absorption coefficient. The apparent band gap has been found directly proportional to N2/3, showing that the effect of Burstein-Moss shift on the band gap variations dominates over the many-body effect. With only standard cleaning protocols, the work function of ZnO: (Al, Mn) and ZnO: Al films have been measured to be 4.26 and 4.21eV, respec tively. The incorporation of Mn element into the matrix of ZnO, as a relatively deep donor, can remove some electrons from the conduction band and deplete the d ensity of occupied states at the Fermi energy, which causes a loss in measured p hotoemission intensity and an increase in the surface work function. Based on th e band gap and work function results, the energy band diagram of the ZnO: (Al, M n) film near its surface is also given. 关 键 词:透明氧化薄膜 能隙 光学吸收系数 工作函数 UPS
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