Effect of substrate temperature on microstructural and optical properties of ZnO films grown by pulsed laser deposition

查看全文 作　　者：HE Jianting ZHUANG Huizhao XUE Chengshan WANG Shuyun HU Lijun XUE [1]Shoubin

机构地区：[1]Institute of Semiconductor, Shandong Normal University, Jinan 250014, China

出　　处：《Rare Metals》索引2006年第25卷第2期,共5页

基　　金：This work was financially supported by the Key Research Program of National Natural Science Foundation of China (No. 90301002 and No. 90201025) 摘　　要：ZnO thin films were deposited on n-Si (111) at various substrate temperatures by pulsed laser deposition (PLD). X-ray diffraction (XRD), photoluminescence (PL), Fourier transform infrared spectrophotometer (FTIR), and scanning electron microscopy (SEM) were used to analyze the structure, morphology, and optical property of the ZnO thin films. An optimal crystallized ZnO thin film was obtained at the substrate temperature of 600°C. A blue shift was found in PL spectra due to size confinement effect as the grain sizes decreased. The surfaces of the ZnO thin films were more planar and com- pact as the substrate temperature increased. 关键词：半导体材料氧化锌薄膜 PLD 六纤维锌矿结构光学性质脉冲激光器

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Effect of substrate temperature on microstructural and optical properties of ZnO films grown by pulsed laser deposition

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