Effects of precursor evaporation temperature on the properties of the yttri- um oxide thin films deposited by microwave electron cyclotron res- onance plasma assisted metal organic chemical vapor deposition

查看全文 作　　者：Barve S A; Jagannath; Mithal N; Deo M N; Biswas A; Mishra R; Kishore R; Bhanage B M; Gantayet L M; Patil D S 出　　处：《Thin Solid Films》索引2010年第519卷第10期,共0页