Decomposition of trifluoromethane in a dielectric barrier discharge non-thermal plasma reactor

查看全文 作　　者：M. Sanjeeva [1]Gandhi;Y. S. [1]Mok

机构地区：[1]Department of Chemical and Biological Engineering, Jeju National University

出　　处：《Journal of Environmental Sciences》索引2012年第24卷第7期,共6页

基　　金：supported by the Basic Science Research Program through the National Research Foundation of Korea (NRF)funded by the Ministry of Education,Science and Technology (Grant Number 2010-0021672) 摘　　要：The decomposition of trifluoromethane (CHF3) was carried out using non-thermal plasma generated in a dielectric barrier discharge (DBD) reactor. The effects of reactor temperature, electric power, initial concentration and oxygen content were examined. The DBD reactor was able to completely destroy CHF3 with alumina beads as a packing material. The decomposition efficiency increased with increasing electric power and reactor temperature. The destruction of CHF3 gradually increased with the addition of O2 up to 2%, but further increase in the oxygen content led to a decrease in the decomposition efficiency. The degradation pathways were explained with the identified by-products. The main by-products from CHF3 were found to be COF2, CF4, CO2 and CO although the COF2 and CF4 disappeared when the plasma were combined with alumina catalyst. 关键词：等离子体反应器分解效率三氟甲烷电介质放电势垒氧化铝催化剂 CHF3

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Decomposition of trifluoromethane in a dielectric barrier discharge non-thermal plasma reactor

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