Effect of oxide film on nanoscale mechanical removal of pure iron

查看全文 作　　者：Jinwei [1]LIU;Liang [1]JIANG;Changbang [1]DENG;Wenhao [2]DU;Linmao [1]QIAN

机构地区：[1]Tribology Research Institute, State Key Laboratory of Traction Power, Southwest Jiaotong University;[2]Institute of Machinery Manufacturing Technology, China Academy of Engineering Physics

出　　处：《Friction》索引2018年第6卷第3期,共9页

基　　金：financial support provided by the National Natural Science Foundation of China (No. 51605396);Young Elite Scientists Spon- sorship Program by CAST (No. YESS20160056);Science Challenge Project (No. TZ2018006-0101-04);Self- developed Project of State Key Laboratory of Traction Power (No. 2017TPL_Z02) 摘　　要：In this paper, the properties of an oxide film formed on a pure iron surface after being polished with an H_2O_2-based acidic slurry were investigated using an atomic force microscope(AFM), Auger electron spectroscopy(AES), and angle-resolved X-ray photoelectron spectroscopy(AR-XPS) to partly reveal the material removal mechanism of pure iron during chemical mechanical polishing(CMP). The AFM results show that, when rubbed against a cone-shaped diamond tip in vacuum, the material removal depth of the polished pure iron first slowly increases to 0.45 nm with a relatively small slope of 0.11 nm/μN as the applied load increases from 0 to 4 μN, and then rapidly increases with a large slope of 1.98 nm/μN when the applied load further increases to 10 μN. In combination with the AES and AR-XPS results, a layered oxide film with approximately 2 nm thickness(roughly estimated from the sputtering rate) is formed on the pure iron surface. Moreover, the film can be simply divided into two layers, namely, an outer layer and an inner layer. The outer layer primarily consists of FeO OH(most likely α-FeOOH) and possibly Fe_2O_3 with a film thickness ranging from 0.36 to 0.48 nm(close to the 0.45 nm material removal depth at the 4 μN turning point), while the inner layer primarily consists of Fe_3O_4. The mechanical strength of the outer layer is much higher than that of the inner layer. Moreover, the mechanical strength of the inner layer is quite close to that of the pure iron substrate. However, when a real CMP process is applied to pure iron, pure mechanical wear by silica particles generates almost no material removal due to the extremely high mechanical strength of the oxide film. This indicates that other mechanisms, such as in-situ chemical corrosion-enhanced mechanical wear, dominate the CMP process. 关键词：原子力显微镜摩擦学物理性能性能分析

相关文献

参考文献（29）
引证文献（3）
耦合文献（0）

参考文献(29)

引证文献(3)

互联网出版许可证新出网证(渝)字10号全国400电话 - 免长途话费

Effect of oxide film on nanoscale mechanical removal of pure iron

参考文献(29)

引证文献(3)

用户提示