维普中文期刊产品整合服务

Development and Implementation of a Rotating Nanoimprint Lithography Tool for Orthogonal Imprinting on Edges of Curved Surfaces

查看全文 作　　者：Shraddha [1]Supreeti;Ralf [2]Schienbein;Patrick [3]FeBer;Florian [4]Fern;Martin [5]Hoffmann;Stefan [3]Sinzinger 高影响力作者 机构地区：[1]Electronics Technology Group,Technical University of Ilmenau,Ilmenau,Germany;[2]Institute for Design and Precision Engineering,Technical University of Ilmenau,Ilmenau,Germany;[3]Technical Optics Group,Technical University of Ilmenau,Ilmenau,Germany;[4]JUMO GmbH&Co.KG,Fulda,Germany;[5]Microsystems Technology Group,Ruhr-University Bochum,Bochum.Germany高影响力机构 出　　处：《Nanomanufacturing and Metrology》索引2021年第4卷第3期,共6页高影响力期刊 基　　金：the support by the Deutsche Forschungsgemeinschaft(DFG)in the framework of the Research Training Group Tip and Laser-based 3D-Nanofabrication in extended macroscopic working areas(GRK 2182)at the Technische Universitat Ilmenau,Germany. 摘　　要：Uniform molding and demolding of structures on highly curved surfaces through conformal contact is a crucial yet often-overlooked aspect of nanoimprint lithography(NIL).This study describes the development of a NIL tool and its integration into a nanopositioning and nanomeasuring machine to achieve high-precision orthogonal molding and demolding for soft ultraviolet-assisted NIL(soft UV-NIL).The process was implemented primarily on the edges of highly curved plano-convex substrates to demonstrate structure uniformity on the edges.High-resolution nanostructures of sub-200-nm lateral dimension and microstructures in the range of tens of microns were imprinted.However,the nanostructures on the edges of the large,curved substrates were difficult to characterize precisely.Therefore,microstructures were used to measure the structure fidelity and were characterized using profilometry,white light interferometry,and confocal laser scanning microscopy.Regardless of the restricted imaging capabilities at high inclinations for high-resolution nanostructures,the scanning electron microscope(SEM)imaging of the structures on top of the lens substrate and at an inclination of 45°was performed.The micro and nanostructures were successfully imprinted on the edges of the plano-convex lens at angles of 45°,60°,and 90°from the center of rotation of the rotating NIL tool.The method enables precise imprinting at high inclinations,thereby presenting a different approach to soft UV-NIL on curved surfaces. 关 键 词：Nanoimprint lithography Rotating NIL tool Curved surface IMPRINTING NANOPOSITIONING
相关文献

参考文献(14)

耦合文献(11)

网站首页 | 关于我们 | 联系我们 | 产品服务 | 客服中心 | 广告服务 | 版权声明 | 网站联盟 | 友情链接 | 售卡网点

版权所有© 渝B2-20050021-1　渝公网安备 50019002500403号　违法和不良信息举报中心

互联网出版许可证 新出网证(渝)字10号 全国400电话 - 免长途话费