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| 1 | Oxidation of TiN, ZrN, TiZrN, CrN, TiCrN and TiN/CrN multilayer hard coatings reactively sputtered at low temperature显示文摘 | PANJAN P NAVINSEK B CVELBAR A | 1996 | Thin Solid Films1996，，12： | 1 |
| 2 | Characterization of low temperature CrN and Tin PVD hard coatings 显示文摘 | Panjan P Cvelbar A | 1995 | Surface and Coatings Technology1995，，： | 1 |
| 3 | Characterization of low temperature CrN and TiN (PVD) hard Coating 显示文摘 | Navinsev B Panjan P Cvelbar A | 1995 | Surf Coat Technol1995，7475，： | 1 |
| 4 | Influence of oxygen and nitrogen plasma treatment on polyethylene tereph- thalate (PET) polymers显示文摘 | Junkar I Vesel A Cvelbar U | 2009 | Vacuum2009，84，1： | 1 |
| 5 | A continuous electrical resistivity measurement in thin films显示文摘 | CVELBAR A PANJAN P NAVIN(S)EK B ZALAR A BUDNAR M TRONTELJ L | 1995 | Thin Solid Film1995，270，12： | 1 |
| 6 | Plasma nanoscience: set- ting directions, tackling grand challenges 显示文摘 | Ostrikov K Cvelbar U Murphy A B | 2011 | Journal of Phys- ics D: Applied Physics2011，44，17： | 1 |
| 7 | Influence of oxygen and ni- trogen plasma treatment on polyethylene terephthalate polymers显示文摘 | JUNKAR I VESEL A CVELBAR U | 2009 | Original Research Article Vacuum2009，84，1： | 1 |
| 8 | High temperature oxidation TiN/CrN multilayers reactively sputtered at low temperature显示文摘 | Panjan P Navinsik B Cvelbar A | 1998 | Surface and Coating1998，1998，98： | 1 |
| 9 | Characterization of low temperature CrN and TiN (PVD) hard coatings显示文摘 | Navinsek B Panjan P Cvelbar A | 1995 | Surface and Coatings Technology1995，，7475： | 1 |
| 10 | The performance of the slovenian hotel industry: evaluation post-privatisation 显示文摘 | Assaf A Cvelbar L K | 2010 | Intemational Journal of Hospitality Research2010，12，5： | 1 |
| 11 | Characterization of low temperature CrN and TiN (PVD) hard coatings 显示文摘 | NAVINSEK B PAN JAN P CVELBAR A | 1995 | Surface and Coatings Technology1995，74，131： | 1 |
| 12 | Influence of oxygea and nitrogen plasma 'treatment on polyethylene terephthtdte (PET) polymers显示文摘 | Junkar I Vesel A Cvelbar U | 2010 | Vacuum2010，84，1： | 1 |
| 13 | Oxidation of TiN,ZrN,TiZrN,CrN,TiCrN and TiN/CrN multilayer hard coatings reactively sputtered at low temperature显示文摘 | Panjan P Navinsek B Cvelbar A | 1996 | Thin Solid Films1996，282，12： | 1 |
| 14 | The performance of the slovenian hotel industry evaluation post--privatisation 显示文摘 | Assaf A Cvelbar L K | 2010 | International Journal of Hospitality Research2010，，5： | 1 |
| 15 | CRM and the bottom line: Do all CRM dimensions affect finn performance? 显示文摘 | JOSIASSEN A ASSAF A G CVELBAR L K | 2014 | International Journal of Hospitality Management2014，，36： | 1 |
| 16 | Characterization of low temperature CrN and TiN (PVD) hard coatings显示文摘 | NAVINSEK B PANJAN P CVELBAR A | 1995 | Surface and Coatings Technology1995，7475，13： | 1 |
| 17 | Characterization of Low Temperature CrN and TiN (PVD)Hard Coating显示文摘 | Navinsek B Panjan P Cvelbar A | 1995 | Surf Coat Technol1995，7475，： | 1 |
| 18 | Characterization of low temperature CrN and TiN(PVD) hard coatings显示文摘 | Navinsek B Panjan P and Cvelbar A | 1995 | Surface and Coatings Technology1995，7475，13： | 1 |
| 19 | Characterization of low temperature CrN and TiN (PVD) hard coatings显示文摘 | NAVINSEK B PANJAN P Cvelbar A | 1995 | Surface and Coatings Technology1995，7475，： | 1 |
| 20 | Plasma effects on the bacteria Escherichia coli via two evaluation methods显示文摘The degradation of?Escherichia coli?bacteria?by treatment with?cold,?weakly ionised, highly dissociated oxygen plasma,?with?an?electron temperature of 3 e V, a?plasma density of 8?×?10^(15)m^(-3) and a?neutral oxygen atom density of 3.5?×?1021m^(-3) was studied. To determine the ‘real' plasma effects,?two methods were used for evaluation and determination, as well as a comparison of the number of?bacteria that had?survived: the standard plate count technique(PCT) and?advanced fluorescence-activated cell sorting(FACS). Bacteria were deposited onto glass substrates and kept below 50 °C during the experiments with oxygen plasma. The results showed that the?bacteria had?fully degraded after about 2 min of plasma treatment, depending slightly on the amount of bacteria that had been?deposited on the substrates. The very?precise determination of the O flux on?the substrates and the two-method comparison allowed for the determination of the critical dose of oxygen atoms required for the destruction of a bacterial cell wall—about 6?×?10^(24)m^(-2)—as well as deactivation of the substrates—about 8?×?1025m^(-2).These results were taken in order to discuss other results obtained by comparable studies and scientific method?evaluations in the determination of plasma effects on bacteria. | Danijela VUJO?EVI? Uro? CVELBAR Ur?ka REPNIK Martina MODIC Sa?a LAZOVI? Tina ZAVA?NIK-BERGANT Nevena PUA? Boban MUGO?A Evangelos GOGOLIDES Zoran Lj PETROVI? Miran MOZETI? | 2017 | Plasma Science and Technology2017，19，7： | 0 |
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