2篇
您的检索式：作者名="Donghwi Cho"
|
|
|
题名
|
作者
|
年代
|
出处
|
被引量
|
| 1 | Fundamental principles and development of proximity-field nanopatterning toward advanced 3D nanofabrication显示文摘Three-dimensional(3D)nanoarchitectures have offered unprecedented material performances in diverse applications like energy storages,catalysts,electronic,mechanical,and photonic devices.These outstanding performances are attributed to unusual material properties at the nanoscale,enormous surface areas,a geometrical uniqueness,and comparable feature sizes with optical wavelengths.For the practical use of the unusual nanoscale properties,there have been developments for macroscale fabrications of the 3D nanoarchitectures with process areas over centimeter scales.Among the many fabrication methods for 3D structures at the nanoscale,proximity-field nanopatterning(PnP)is one of the promising techniques that generates 3D optical holographic images and transforms them into material structures through a lithographic process.Using conformal and transparent phase masks as a key factor,the PnP process has advantages in terms of stability,uniformity,and reproducibility for 3D nanostructures with periods from 300 nm to several micrometers.Other merits of realizing precise 3D features with sub-100 nm and rapid processes are attributed to the interference of coherent light diffracted by phase masks.In this review,to report the overall progress of PnP from 2003,we present a comprehensive understanding of PnP,including its brief history,the fundamental principles,symmetry control of 3D nanoarchitectures,material issues for the phase masks,and the process area expansion to the wafer-scale for the target applications.Finally,technical challenges and prospects are discussed for further development and practical applications of the PnP technique. | Sang-Hyeon Nam Gayea Hyun Donghwi Cho Seonggon Han Gwangmin Bae Haomin Chen Kisun Kim Youngjin Ham Junyong Park Seokwoo Jeon | 2021 | Nano Research2021，14，9： | 1 |
| 2 | Recent advances in lithographic fabrication of micro-/nanostructured polydimethylsiloxanes and their soft electronic applications显示文摘The intensive development of micro-/nanotechnologies offers a new route to construct sophisticated architectures of emerging soft electronics.Among the many classes of stretchable materials,micro-/nanostructured poly(dimethylsiloxane)(PDMS)has emerged as a vital building block based on its merits of flexibility,stretchability,simple processing,and,more importantly,high degrees of freedom of incorporation with other functional materials,including metals and semiconductors.The artificially designed geometries play important roles in achieving the desired mechanical and electrical performances of devices and thus show great potential for applications in the fields of stretchable displays,sensors and actuators as well as in health-monitoring device platforms.Meanwhile,novel lithographic methods to produce stretchable platforms with superb reliability have recently attracted research interest.The aim of this review is to comprehensively summarize the progress regarding micro-/nanostructured PDMS and their promising soft electronic applications.This review is concluded with a brief outlook and further research directions. | Donghwi Cho Junyong Park Taehoon Kim Seokwoo Jeon | 2019 | Journal of Semiconductors2019，40，11： | 1 |
您所在的机构暂未开通此部分的功能，请联系管理员