| 2 | Spin synthesis of monolayer of SiO_2 thin films显示文摘The highly ordered monolayer of submicron size silica(SiO2) particles(235 nm) is developed on p-silicon by using three-step spin-coating in colloidal suspension,which has significant potential in various applications.The influence of three-step spin speeds,spinning time,acceleration time between different steps,concentration of SiO_2 particles in the solution,solution quantity,and the ambient humidity(relative humidity) on the properties of monolayer SiO_2 are studied in order to achieve a large area monolayer film.A relatively high surface coverage and uniform monolayer film of SiO_2 particles in the range of 85%-90%are achieved by appropriate control of the preparative parameters.We conclude that this method can be useful in industrial applications,because of the fabrication speed,surface coverage and cost of the process. | S.S.Shinde S.Park J.Shin | 2015 | Journal of Semiconductors2015，36，4： | 0 |
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