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1篇 您的检索式：作者名="Maria YOUNUS"

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		题名	作者	年代	出处	被引量
	1	Evolution of plasma parameters in an Ar-N2/He inductive plasma source with magnetic pole enhancement显示文摘Magnetic pole enhanced inductively coupled plasmas(MaPE-ICPs) are a promising source for plasma-based etching and have a wide range of material processing appUcations.In the present study Langmuir probe and optical emission spectroscopy were used to monitor the evolution of plasma parameters in a MaPE-ICP Ar-N_2/He mixture plasma.Electron density(n_e) and temperature(T_e),excitation temperature(T_(exc)),plasma potential(V_p),skin depth(δ) and the evolution of the electron energy probability function(EEPF) are reported as a function of radiofrequency(RF) power,pressure and argon concentration in the mixture.It is observed that n_e increases while T_e decreases with increase in RF power and argon concentration in the mixture.The emission intensity of the argon line at 750.4 nm is also used to monitor the variation of the 'high-energy tail' of the EEPF with RF power and gas pressure.The EEPF has a'bi-Maxwellian' distribution at low RF powers and higher pressure in a pure N_2 discharge.However,it evolves into a 'Maxwellian' distribution at RF powers greater than 70 W for pure N_2,and at 50 W for higher argon concentrations in the mixture.The effect of argon concentration on the temperatures of two electron groups in the 'bi-Maxwellian' EEPF is examined.The temperature of the low-energy electron group T_L shows a decreasing trend with argon addition until the 'thermalization' of the two temperatures occurs,while the temperature of high-energy electrons T_H decreases continuously.	Maria YOUNUS N U REHMAN M SHAFIQ M NAEEM M ZAKA-UL-ISLAM M ZAKAULLAH	2017	Plasma Science and Technology2017，19，2：	2

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