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| 1 | A comparison of the effectiveness of dexmedetomidine versus propofol target‐controlled infusion for sedation during fibreoptic nasotracheal intubation显示文摘 | C.‐J.Tsai K.‐S.Chu T.‐I.Chen D. V.Lu H.‐M.Wang I.‐C.Lu | 2010 | Anaesthesia2010，，3： | 1 |
| 2 | Segmenting Time Series:A Survey and Novel Approach显示文摘 | E.Keogh S.Chu D.Hart M.Pazzani | | 0，，： | 1 |
| 3 | A comparison of the effectiveness of dexmedetomidine versus propofol target‐controlled infusion for sedation during fibreoptic nasotracheal intubation显示文摘 | C.‐J.Tsai K.‐S.Chu T.‐I.Chen D. V.Lu H.‐M.Wang I.‐C.Lu | 2010 | Anaesthesia2010，，3： | 1 |
| 4 | 查看详情显示文摘 | S.Chu | | 0，，03： | 1 |
| 5 | 使用氩离子击穿PVD阻挡层工艺提高90nm双大马真士革互联的参变量和可靠性(英文)显示文摘随着金属导线线宽的不断缩小,在90nm 技术以下,刻蚀残留物的存在会在应力迁移测试中形成高通孔电阻和空洞成核现象。物理氩离子预清洗是一种去除残留物的有效方法。但在应力迁移测试中发现,底部沟槽铜的二次溅射会导致器件的早期失效。反应性预清洗方法由于含有H +、H 类粒子而在减少C uO x 和清洗Si,N ,F,C ,O ,等蚀刻残留物时表现出其优越性。提出了针对传统PV D 工艺的反应性预清洗及PV D 击穿(沉积,刻蚀,沉积)工艺的解决方案。阻挡层击穿工艺减少了通孔电阻,提高了应力迁移性能,并通过薄钽沉积工序防止了铜的扩散从而保护了双嵌入斜面和错位通孔。此外,使电子阻塞和局部加热效应最小化的U 型界面,提高了电子迁移失效的平均时间,一致的、可重复的覆盖膜特性和良好的电参量测试结果已经证实了这种工艺的生产价值。 | N.Kumar S.Chu D.L.Diehl K.Maekawa K.Mon K.Kobayashi M.Yoneda | 2005 | 电子工业专用设备2005，34，8： | 0 |
| 6 | IMPROVEMENT IN PARAMETRIC AND RELIABILITY PERFORMANCE OF 90NM DUAL-DAMASCENE INTERCONNECTS USING AR+PUNCHTHRU PVD BARRIER PROCESS Reprinted with permission as presented at SEMICON China 2005显示文摘As interconnects shrink beyond 90nm node, the presence of etch residues can createhigh via resistance and void nucleation during stress migration (SM) testing. Physical Ar+ preclean is effectivein removing residues, but early SM failures have been seen due to Cu resputter from underlying trenches.Reactive preclean methods show promise in reducing CuOx and cleaning Si, N, F, C,O etch residues inpresence of H+, H* species. In this paper, reactive preclean and PVD PunchThru process (deposit-etch-deposit) is proposed as solution to conventional PVD.The PunchThru process reduces via resistance, improves SM and protects dual-damascene beveland unlanded vias from Cu diffusion by presence of thin Ta deposition step. In addition, the U-shaped interface,which minimizes electron crowding and localized heating effects, increases the mean time to failureby electromigration. Consistent, repeatable blanket film property and good parametric electrical test resultshave proven the production worthiness of this process. | N.Kumar S.Chu D.L.Diehl K.Maekawa K.Mori K.Kobayashi M.Yoneda | 2005 | 集成电路应用2005，22，9： | 0 |
| 7 | Resolution-enhanced X-ray fluorescence microscopy via deep residual networks显示文摘Multimodal hard X-ray scanning probe microscopy has been extensively used to study functional materials providing multiple contrast mechanisms.For instance,combining ptychography with X-ray fluorescence(XRF)microscopy reveals structural and chemical properties simultaneously.While ptychography can achieve diffraction-limited spatial resolution,the resolution of XRF is limited by the X-ray probe size.Here,we develop a machine learning(ML)model to overcome this problem by decoupling the impact of the X-ray probe from the XRF signal.The enhanced spatial resolution was observed for both simulated and experimental XRF data,showing superior performance over the state-of-the-art scanning XRF method with different nano-sized X-ray probes.Enhanced spatial resolutions were also observed for the accompanying XRF tomography reconstructions.Using this probe profile deconvolution with the proposed ML solution to enhance the spatial resolution of XRF microscopy will be broadly applicable across both functional materials and biological imaging with XRF and other related application areas. | Longlong Wu Seongmin Bak Youngho Shin Yong S.Chu Shinjae Yoo Ian K.Robinson Xiaojing Huang | 2023 | npj Computational Materials2023，，1： | 0 |
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