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20篇 您的检索式：作者名="STOLTZ D A"

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	题名	作者	年代	出处	被引量
1	Recombinant protein expression in a Drosophila cell line : comparison with the baculovirus system显示文摘	Bernard A R Handson J F Stoltz D B	1994	Cytotechnology1994，15，13：	1
2	J Parm Sci显示文摘	Stoltz M Oliver D W Wessels P L Chalmers A A	1991	80:3571991，80，：	1
3	Disruption of the CFTR gene produces a model of cystic fibrosis in newborn pigs 显示文摘	ROGERS C S STOLTZ D A MEYERHOLZ D K	2008	Sci- ence2008，321，5897：	1
4	Isolation and sequence of a cDNA encoding the Jerusalem artichoke cinnamate 4-hydroxylase,a major plant cytochrome P450 involved in the general phenylpropanoid pathway显示文摘	Teutsch H G Hasenfratz M P Lesot A Stoltz C Garnier J M Jeltsch J M Durst F and Werck R D		0，，04：	1
5	Lithography factors that determine the aspect ratio of electron cyclotron resonance plasma etched HgCdTe trenches显示文摘	J D Benson A J Stoltz P R Boyd	2003	Journal of Electronic Materials2003，32，68：	1
6	Examination of the effects of high-density plasmas on the surface of HgCdTe显示文摘	A J Stoltz M Jaime-Vasquez J D Benson	2006	Journal of Electronic Materials2006，35，6：	1
7	Disruption of the CFTR gene produces a model of cystic fibrosis in newborn pigs显示文摘	ROGERS C S STOLTZ D A MEYERHOLZ D K	2008	Science2008，321，5897：	1
8	The effect of electron cyclotron resonance plasma parameters on the aspect ratio of trenches in HgCdTe显示文摘	A J Stoltz J D Benson P R Boyd	2003	Journal of Electronic Materials2003，32，7：	1
9	Determination of the ion angular distribution for electron cyclotron resonance, plasma-etched HgCdTe trenches显示文摘	J D Benson A J Stoltz J B Varesi	2004	Journal of Electronic Materials2004，33，6：	1
10	Effect of photoresist-feature geometry on electrom-cyclotron resonance plasma-etch reticulation of HgCdTe Nodes显示文摘	J D Benson A J Stoltz A W Kaleczyc	2002	Journal of Electronic Materials2002，31，7：	1
11	Disruption of the CFTR gene produces a model of cystic fibrosis in newborn pigs 显示文摘	ROGERS C S STOLTZ D A MEYERHOLZ D K	2008	Science2008，321，5897：	1
12	Comparing ICP and ECR Etching of HgCdTe, CdZnTe, and CdTe显示文摘	A J Stoltz J B Varesi J D Benson	2007	Journal of Electronic Materials2007，36，8：	1
13	Involvement in Traditional and Electronic Bullying Among Adolescents显示文摘	Raskauskas J Stoltz A D	2007	Developmental Psychology2007，43，3：	1
14	Lithography Factors that Determine the Aspect Ratio of Electron Cyclotron Resonance Plasma Etched HgCdTe Trenches显示文摘	BENSON J D STOLTZ A J BOYD P R	2003	Journal of Electronic Materials2003，32，7：	1
15	The Effect of Electron Cyclotron Resonance Plasma Parameters on the Aspect Ratio of Trenches in HgCdTe显示文摘	A J Stoltz J D Benson	2003	Journal of Electronic Materials2003，32，7：	1
16	Lithography Factors That Determine the Aspect Ratio of Electron Cyclotron Resonance Plasma Etched HgCdTe Trenches显示文摘	J D Benson A J Stoltz P R Boyd	2003	Journal of Electronic Materials2003，32，7：	1
17	Lithography factors that determine the aspect ration of electron cyclotron resonance plasma etched HgCdTe trenches显示文摘	J D Benson A J Stoltz P R Boyd	2003	Journal of Electronic Materials2003，32，7：	1
18	Morphology of Inductively Coupled Plasma Processed HgCxtTe Surfaces 显示文摘	A J Stoltz J D Benson P J Smith	2008	Journal of Electronic Materials2008，37，9：	1
19	Journal of Invertebrate Pathology显示文摘	Barratt B I P Evans A A Stoltz D B	1999	73:182-1881999，73，：	1
20	A survey of energy policy priorities in the United States: Energy supply security, economics, and the environment显示文摘	Manley D K Hines V A Jordan M W Ronald E Stoltz	2013	Energy Policy2013，60，9：	1

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