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25篇 您的检索式：作者名="Bohlmark J"

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	题名	作者	年代	出处	被引量
1	The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge 显示文摘	Bohlmark J Lattemann M Gudmundsson J T	2006	Thin Solid Films2006，515，：	1
2	Ionized physical vapor deposition (IPVD): A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
3	Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel 显示文摘	Lattemann M Ehiasarian A P Bohlmark J	2006	Surf Coat Techn2006，200，：	1
4	Ion- ized physical vapor deposition ( IPVD ) : A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，12：	1
5	Guiding the deposition flux in an ionized magnetron discharge 显示文摘	Bohlmark J Ostbye M Lattemann M	2006	Thin Solid Films2006，515，：	1
6	Microstructure control of CrNx films during high power impulse magnetron sputtering 显示文摘	GRECZYNSKI G JENSEN J BOHLMARK J HULTMAN L	2010	Surface and Coatings Technology2010，205，：	1
7	Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel 显示文摘	LATTEMANN M EHIASARIAN A P BOHLMARK J PERSSON P A O HELMERSSON U	2006	Surface and Coatings Technology2006，200，：	1
8	Plasma Dymun- ics in a Highly Ionized Pulsed Magnetmn Discharge显示文摘	Alami J Gudmundsson J T Bohlmark J	2005	Plas- ma Sources Science and Technology2005，14，3：	1
9	Ionized physical vapor deposition (IPVD):A review of technology and applications显示文摘	Bohlmark J Lattemann M	2006	Thin Solid Films2006，513，12：	1
10	Microstructure Control of CrNx Films during High Power Impulse Magne- tron Sputtering 显示文摘	Greczynski G Jensen J Bohlmark J	2010	Surface & Coatings Technology2010，205，：	1
11	Ionization of sputtered metais in high power pulsed magnetron sputtering 显示文摘	Bohlmark J Alami J Christou C	2005	JVac SciTechnol A Vac Surf Films2005，23，1：	1
12	Investigation of High Power Impulse Magnetron Sput- tering Pretreated Interfaces for Adhesion Enhancement of Hard Coatings on Steel显示文摘	LATTEMANN M EHIASARIAN A P BOHLMARK J	2006	Surface and Coatings Technol-ogy2006，200，22：	1
13	Spatial electron density distribution in a high-power pulsed magnetron discharge 显示文摘	Bohlmark J Gudmundsson J T Alami J	2005	IEEE Trans Plasma Sei2005，33，2：	1
14	Ionized physical vapor deposition (IPVD): A review of technology and applica- tions 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
15	Ionized Physical Vapor Deposition (IPVD): A Review of Technology and Applications显示文摘	HELMERSSON U LATTEMANN M BOHLMARK J	2006	Thin Solid Films2006，513，1：	1
16	Spatial e lectron density distribution in a high-power pulsed magne tron discharge 显示文摘	Bohlmark J Gudmundsson J T Alami J	2005	IEEE Transactions on Plasma Science2005，33，2：	1
17	Ionized physical vapor deposition (IPVD): A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
18	Plasma dynamics in a highly ionized pulsed magnetron discharge 显示文摘	Alami J Gudmundsson J T Bohlmark J	2005	Plasma Sources Sci Technol2005，14，3：	1
19	Ionized phy-sical vapor deposition (IPVD ) : A review of technology andapplications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，12：	1
20	Guiding the Deposition Flux in an Ionized Magnetron Discharge显示文摘	BOHLMARK J OSTBYE M LATTEMANN M	2006	Thin Solid Films2006，515，4：	1

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