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23篇 您的检索式：作者名="LATTEMANN M"

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	题名	作者	年代	出处	被引量
1	The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge 显示文摘	Bohlmark J Lattemann M Gudmundsson J T	2006	Thin Solid Films2006，515，：	1
2	Surface & Coatings Technology显示文摘	Lattemann M Ulrich S	2007	201: 55642007，201，：	1
3	Ionized physical vapor deposition (IPVD): A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
4	Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel 显示文摘	Lattemann M Ehiasarian A P Bohlmark J	2006	Surf Coat Techn2006，200，：	1
5	Ion- ized physical vapor deposition ( IPVD ) : A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，12：	1
6	Guiding the deposition flux in an ionized magnetron discharge 显示文摘	Bohlmark J Ostbye M Lattemann M	2006	Thin Solid Films2006，515，：	1
7	Fully dense, non-faceted 1 ll-textured high power impulse magnetron sputteringTiN films grown in the absence of substrate heating and bias 显示文摘	LATTEMANN M HELMERSSON U GREENE J E	2010	Thin Solid Films2010，518，：	1
8	Investigation of high power impulse magnetron sputtering pretreated interfaces for adhesion enhancement of hard coatings on steel 显示文摘	LATTEMANN M EHIASARIAN A P BOHLMARK J PERSSON P A O HELMERSSON U	2006	Surface and Coatings Technology2006，200，：	1
9	Ionized physical vapor deposition (IPVD):A review of technology and applications显示文摘	Bohlmark J Lattemann M	2006	Thin Solid Films2006，513，12：	1
10	Non-faceted 111textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias显示文摘	Lattemann M Helmersson U	2010	Thin Solid Films2010，518，21：	1
11	Investigation of High Power Impulse Magnetron Sput- tering Pretreated Interfaces for Adhesion Enhancement of Hard Coatings on Steel显示文摘	LATTEMANN M EHIASARIAN A P BOHLMARK J	2006	Surface and Coatings Technol-ogy2006，200，22：	1
12	Ionized physical vapor deposition (IPVD): A review of technology and applica- tions 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
13	Ionized Physical Vapor Deposition (IPVD): A Review of Technology and Applications显示文摘	HELMERSSON U LATTEMANN M BOHLMARK J	2006	Thin Solid Films2006，513，1：	1
14	Ionized physical vapor deposition (IPVD): A review of technology and applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，1：	1
15	New Approach in Depositing Thick, Layered Cubic Boron Nitride Coatings by Oxygen Ad- dition-Structural and Compositional Analysis显示文摘	Lattemann M Ulrich S Ye J	2006	Thin SolidFilms2006，515，：	1
16	Ionized phy-sical vapor deposition (IPVD ) : A review of technology andapplications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，12：	1
17	Guiding the Deposition Flux in an Ionized Magnetron Discharge显示文摘	BOHLMARK J OSTBYE M LATTEMANN M	2006	Thin Solid Films2006，515，4：	1
18	The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge显示文摘	Bohlmark J Lattemann M Gudmundsson J T	2006	Thin Solid Films2006，515，4：	1
19	Ionized Physi- cal Vapor Deposition (IPVD) : a Review of Technology and Applications 显示文摘	Helmersson U Lattemann M Bohlmark J	2006	Thin Solid Films2006，513，12：	1
20	Influence of residual water on magnetron sputter deposited crystalline A1203 thin films显示文摘	Wallin E Andersson J M Lattemann M et ol	2008	Thin Solid Films2008，，516：	1

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