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| 1 | 开放系统中农作物对空气CO_2浓度增加的响应显示文摘FACE试验 (free airCO2 enrichment)开展的 10多年中 ,供试农作物主要有 :C3 禾本科作物小麦(TriticumaestivumL .)、多年生黑麦草 (Loliumperenne)和水稻 (OryzasativaL .) ,C4禾本科类高粱(Sorghumbicolor (L .)M ench) ,C3 豆科植物白三叶草 (Trifoliumrepens) ,C3 非禾本科块茎状作物马铃薯 (SolanumtuberosumL .) ,以及多年生C3 类木本作物棉花 (GossypiumhirsutumL .)和葡萄 (VitisviniferaL .) .本文系统整理和分析了以下各项参数的结果 :光合作用、气孔导度、冠层温度、水分利用、水势、叶面积指数、根茎生物量累积、作物产量、辐射利用率、比叶面积、N含量、N收益、碳水化合物含量、物候变化、土壤微生物、土壤呼吸、痕量气体交换以及土壤碳固定 .CO2 浓度升高对农作物的影响作用主要表现在以下方面 :(1)促进了植物光合作用、增加了其生物量累积 ;(2 )显著提高C3 作物产量 ,但对C4作物产量的影响很小 ;(3)降低了C3 和C4作物气孔导度 ,非常显著地提高了所有作物的水分利用率 ;(4)对植物生长的促进作用在水分不足与水分充足时二者相当或前者大于后者 ;(5 )对非豆科植物生长的促进作用要受到土壤低N水平限制 ,而对豆科植物则不受氮肥水平限制 ;(6 )对根系生长的促进作用要大于地上部分 ;(7) | B.A.Kimball 朱建国 程磊 K.Kobayashi M.Bindi | 2002 | 应用生态学报2002，13，10： | 146 |
| 2 | HIGH CYCLE FATIGUE PROPERTIES OF NICKEL-BASE ALLOY 718显示文摘The fatigue properties of nickel-base Alloy 718 with fine- and grain-coarse grains were investigated. In the fine-grain alloy, the fatigue strength normalized by the tensile strengtn was 0.51 at 107 cycles. In contrast, the fatigue strength of the coarse-grain alloy was 0.32 at the same cycles, although the fatigue strengths in the range from 103to 105 cycles are the same for both alloys. The fracture appearances fatigued at around 106 cycles showed internal fractures originating from the flat facets of austenite grains for both alloys. The difference in fatigue strength at 107 cycles between the fine- and coarse-grain alloys could be explained in terms of the sizes of the facets from which the fractures originated. | K.Kobayashi K.Yamaguchi M.Hayakawa M.Kimura | 2004 | Acta Metallurgica Sinica(English Letters)2004，17，4： | 8 |
| 3 | Growth and nitrogen uptake of CO<sub>2</sub>‐enriched rice under field conditions显示文摘 | H. Y.Kim M.Lieffering S.Miura K.Kobayashi M.Okada | 2001 | New Phytologist2001，，2： | 1 |
| 4 | Free‐air CO<sub>2</sub> enrichment (FACE) using pure CO<sub>2</sub> injection: system description显示文摘 | M.Okada M.Lieffering H.Nakamura M.Yoshimoto H. Y.Kim K.Kobayashi | 2001 | New Phytologist2001，，2： | 1 |
| 5 | Prospective randomized trial of preoperative enteral immunonutrition followed by elective total gastrectomy for gastric cancer显示文摘 | K.Fujitani T.Tsujinaka J.Fujita I.Miyashiro H.Imamura Y.Kimura K.Kobayashi Y.Kurokawa T.Shimokawa H.Furukawa | 2012 | Br J Surg2012，，5： | 1 |
| 6 | Surgical resection of solitary adrenal metastasis from esophageal carcinoma following esophagectomy显示文摘 | M. M.Cho K.Kobayashi T.Aoki K.Nishioka K.Yoshida N.Hatano H.Hirose J. H.Moon T.Matsumoto Y.Uemura T.Kaneko K.Okagawa | 2006 | Diseases of the Esophagus2006，，1： | 1 |
| 7 | Utility of thin‐layer preparations in endometrial cytology: Immunocytochemical expression of PTEN, beta‐catenin and p53 for benign endometrial lesions显示文摘 | YoshiakiNorimatsu TomoyukiMiyamoto Tadao K.Kobayashi TomohiroOda TakuyaMoriya KenjiYanoh YasuyukiMiyake EijiOhno | 2008 | Diagn Cytopathol2008，，4： | 1 |
| 8 | Famotidine vs. omeprazole: a prospective randomized multicentre trial to determine efficacy in non‐erosive gastro‐oesophageal reflux disease显示文摘 | Y.Fujiwara K.Higuchi H.Nebiki S.Chono H.Uno K.Kitada H.Satoh K.Nakagawa K.Kobayashi K.Tominaga T.Watanabe N.Oshitani T.Arakawa | 2005 | Alimentary Pharmacology & Therapeutics2005，，： | 1 |
| 9 | Growth and nitrogen uptake of CO2‐enriched rice under field conditions显示文摘 | H. Y.Kim M.Lieffering S.Miura K.Kobayashi M.Okada | 2001 | New Phytologist2001，，2： | 1 |
| 10 | Fine mapping and DNA fiber FISH analysis locates the tobamovirus resistance gene L3 of Capsicum chinense in a 400-kb region of R-like genes cluster embedded in highly repetitive sequences显示文摘 | Tomita R J.Murai Y.Miura H.Ishihara S.Liu Y.Kubotera A.Honda R.Hatta T.Kuroda H.Hamada M.Sakamoto I.Munemura O.Nunomura K.Ishikawa Y.Genda S.Kawasaki K.Suzuki K.Meksem and K.Kobayashi | | 0，，： | 1 |
| 11 | Fine‐needle aspiration cytology of malignant hemangiopericytoma of the salivary gland: A case report显示文摘 | KeikoShimizu SeikoOgura Tadao K.Kobayashi RyojiKushima ShinyaToyokuni YokoIwasa MasamiSakurai | 1999 | Diagn Cytopathol1999，，6： | 1 |
| 12 | Observation of New Isotope^(131)Ag via the Two-Step Fragmentation Technique显示文摘We report on the first observation of the neutron-rich nucleus^(131)Ag.This isotope was produced via fragmentation reactions of intense secondary radioactive ion beams,including 134,135Sn.The secondary beams were produced from induced fission reactions from a stable 238U beam at 345 MeV/nucleon.Secondary reaction residues were selected by the ZeroDegree spectrometer and identified by measuring their magnetic rigidity,time of flight,energy loss,and total kinetic energy. | 王赫 N.Aoi S.Takeuchi M.Matsushita P.Doornenbal T.Motobayashi D.Steppenbeck K.Yoneda K.Kobayashi J.Lee 刘红娜 Y.Kondo R.Yokoyama H.Sakurai 叶沿林 | 2013 | Chinese Physics Letters2013，30，4： | 0 |
| 13 | mKEN 18GHz ECR离子源上金属离子的产生(英文)显示文摘At RIKEN,three ECR ion sources(10GHz ECRIS,18GHz ECRIS and liquid He-free SC-ECRIS) are operated as external ion sources of heavy ion accelerators.In the last year,multi-charged uranium ion beam was produced from 18GHz ECRIS by using UF6 and the 238U ion was successfully accelerated by the accelerator complex which consists of the RFQ linear accelerator,RIKEN heavy ion linear accelerator(RILAC)and RIKEN ring cyclotron accelerator(RRC).The typical beam intensity of238U14+ was about 2pμA on faraday cup after analysing magnet.70Zn beam was still supplied for the new super-heavy element search experiment with insertion method.Intense beam of70Zn16+ was produced for long term(~43 days)without vacuum break and remarkably low material consumption rate(~100μgr/h).We already supplied Zn beam longer than 200 days for this experiment.48Ca ion was also produced by insertion method using48CaO rod for the nuclear physics experiment.In this contribution,we will present ion source parameter and techniques for production of each of the metal ions. | M.Kidera T.Nakagawa T.Kageyama Y.Higurashi H.Haba T.Aihara T.Ohki K.Kobayashi A.Goto Y.Yano | 2007 | Chinese Physics C2007，31，S1： | 0 |
| 14 | 内插器引入高磁导率材料提高片上降压转换器效率显示文摘在本文中,研究了具有铁氧体薄膜的内插器(interposer)上电源电路电感器,以通过向电感器引入高导磁率材料来提高电源电路的效率。在这项工作中,DC-DC降压转换器被用作电源电路。利用场电磁仿真讨论了电感对铁氧体薄膜位置的依赖性。仿真结果表明,铁氧体薄膜应位于电感器的上下两侧和金属之间。通过使用10m厚铁氧体薄膜的电感器,当空心电感器的降压转换器效率为60%时,降压转换器的效率提高了13%。 | H.FUKETA Y.SHINOZUKA K.ISHIDA M.TAKAMIYA T.SAKURAI T.FUJII H.SHIMIZU K.KOBAYASHI T.SATO | 2019 | 磁性元件与电源2019，，2： | 0 |
| 15 | 使用氩离子击穿PVD阻挡层工艺提高90nm双大马真士革互联的参变量和可靠性(英文)显示文摘随着金属导线线宽的不断缩小,在90nm 技术以下,刻蚀残留物的存在会在应力迁移测试中形成高通孔电阻和空洞成核现象。物理氩离子预清洗是一种去除残留物的有效方法。但在应力迁移测试中发现,底部沟槽铜的二次溅射会导致器件的早期失效。反应性预清洗方法由于含有H +、H 类粒子而在减少C uO x 和清洗Si,N ,F,C ,O ,等蚀刻残留物时表现出其优越性。提出了针对传统PV D 工艺的反应性预清洗及PV D 击穿(沉积,刻蚀,沉积)工艺的解决方案。阻挡层击穿工艺减少了通孔电阻,提高了应力迁移性能,并通过薄钽沉积工序防止了铜的扩散从而保护了双嵌入斜面和错位通孔。此外,使电子阻塞和局部加热效应最小化的U 型界面,提高了电子迁移失效的平均时间,一致的、可重复的覆盖膜特性和良好的电参量测试结果已经证实了这种工艺的生产价值。 | N.Kumar S.Chu D.L.Diehl K.Maekawa K.Mon K.Kobayashi M.Yoneda | 2005 | 电子工业专用设备2005，34，8： | 0 |
| 16 | IMPROVEMENT IN PARAMETRIC AND RELIABILITY PERFORMANCE OF 90NM DUAL-DAMASCENE INTERCONNECTS USING AR+PUNCHTHRU PVD BARRIER PROCESS Reprinted with permission as presented at SEMICON China 2005显示文摘As interconnects shrink beyond 90nm node, the presence of etch residues can createhigh via resistance and void nucleation during stress migration (SM) testing. Physical Ar+ preclean is effectivein removing residues, but early SM failures have been seen due to Cu resputter from underlying trenches.Reactive preclean methods show promise in reducing CuOx and cleaning Si, N, F, C,O etch residues inpresence of H+, H* species. In this paper, reactive preclean and PVD PunchThru process (deposit-etch-deposit) is proposed as solution to conventional PVD.The PunchThru process reduces via resistance, improves SM and protects dual-damascene beveland unlanded vias from Cu diffusion by presence of thin Ta deposition step. In addition, the U-shaped interface,which minimizes electron crowding and localized heating effects, increases the mean time to failureby electromigration. Consistent, repeatable blanket film property and good parametric electrical test resultshave proven the production worthiness of this process. | N.Kumar S.Chu D.L.Diehl K.Maekawa K.Mori K.Kobayashi M.Yoneda | 2005 | 集成电路应用2005，22，9： | 0 |
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