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3篇 您的检索式:作者名="Loc Duong"
    题名 作者 年代 出处 被引量
1XPS study of the major minerals in bauxite: Gibbsite, bayerite and (pseudo-)boehmite显示文摘J. Theo Kloprogge Loc V. Duong Barry J. Wood Ray L. Frost 2005Journal of Colloid And Interface Science2005,,2:1
2Design Improvement of the Mechanical Coupling Diaphragms for Aerospace Applications显示文摘Loc Duong Kazem Kazerounian 2007Mechanics Based Design of Structures and Machines2007,35,4:1
3Tuning the inhomogeneous charge transport in ZnO interfaces for ultrahigh on/off ratio top-gated field-effect-transistor arrays显示文摘The interface between oxide/oxide layers shows an inhomogeneous charge transport behavior,which reveals a high conductivity owing to interface-doped.One typical example is the hetero-interface between ZnO film and other wide band gap oxides(e.g.,Al_(2)O_(3),TiO_(2),and HfO_(2)).It is thus quite evident that the ZnO/other oxides hetero-interface contains high density electron carriers effectively screening the gate-induced electric field.Thus,an extremely weak gate modulation in ZnO film was showed,resulting in very low on/off ratio of 1.69 in top-gate field-effect-transistor(TG-FET)configuration.So,to extend the usage of ZnO TG-FET is not quite possible toward further practical application.Herein,we clarified the correlation of inhomogeneous region in oxide/oxide hetero-junction by systematically study.Our work suggests that a self-assembly of molecules(SAM)buffer layer is suitable for tuning the inhomogeneous charge transport in ZnO film,which not only reduces the interface trap density,but also effectively enhances the gate electric field modulation at the hetero-interface.We further report the robust fabrication of TG-FET arrays based on ZnO thin film,using an ultra-thin alkylphosphonic acid molecule monolayer as buffer layer.Our device demonstrates a pronounced ultrahigh on/off ratio of≥10^(8),which is 8-order of magnitude higher than that of a device without buffer layer.For the highly reliable arrays,our device exhibits a high yield of over 93%with an average on/off ratio of^10^(7) across the entire wafer scale,mobility(18.5 cm^(2)/(V·s)),an extended bias-stressing(~2,000 s)and long-stability(~150 days)under ambient conditions.Thanh Luan Phan Dinh Loc Duong Tuan Khanh Chau Sidi Fan Won Tae Kang Thi Suong Le Hyun Yong Song Linfeng Sun Van Tu Vu Min Ji Lee Quoc An Vu Young Hee Lee Woo Jong Yu 2020Nano Research2020,13,11:0
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