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7篇 您的检索式:作者名="Weidian"
    题名 作者 年代 出处 被引量
1Investigation of the radial compression of carbon nanotubes with a scanning probe microscope显示文摘Shen Weidian Jiang Bin Han Baoshan 2000Physical Review Letters2000,84,16:1
2Cu/Ta/SiO2/Si薄膜在纳米压痕下的分层现象研究显示文摘采用磁控溅射技术在热氧化单晶硅衬底上先后淀积了厚度分别为50 nm的Ta膜和400 nm的Cu膜。使用纳米压入仪在样品表面进行压入测试,在薄膜表面制造出残留压痕。使用扫描电镜(SEM)、聚焦离子束(FIB)、透射电镜(TEM)和X射线能谱仪(EDX)对残留压痕形貌、剖面上的分层现象进行观察,确定分层所在的位置。发现在69 mN的最大载荷作用后,在Ta/SiO2界面处发生分层。分层的原因主要归结为在应力作用下,多层膜中各种材料的应变、弹性恢复能力不同。吴子景 吴晓京 卢茜 Shen Weidian 蒋宾 2008半导体技术2008,33,9:1
3Study on the morphology and tribological properties of acrylic based polyurethane/fumed silica composite coatings显示文摘Shuxue Zhou Limin Wu Weidian Shen Guangxin Gu 2004Journal of Materials Science2004,,5:1
4The Changes of the Properties of Acrylic Based Polyurethane Via Addition of Nano-silica显示文摘Shuxue Zhou Limin Wu Jian Sun Weidian Shen 0,,:1
5Cu/Ta/SiO2/Si多层膜纳米压痕与压痕下微观结构的研究显示文摘Cu/Ta/SiO2/Si多层膜结构是目前集成电路制造工艺中的常见结构,其硬度与弹性模量通过纳米压入技术测得。为了表征纳米压痕下的形变微观区域,采用聚焦离子束加工出压痕截面,同时进行扫描电子、扫描离子显微观察,发现样品衬底发生开裂,多层膜结构出现分层现象。TEM分析表明分层出现在Ta/SiO2界面,说明这是该结构的一个薄弱环节。卢茜 吴子景 吴晓京 Weidian Shen 蒋宾 2008电子显微学报2008,27,4:0
6Nanoindentation study of a Cu/Ta/SiO_2/Si multilayer system显示文摘Tantalum and copper layers were deposited on a thermally oxidized Si substrate in a magnetron sputtering process.Nanoindentation was adopted to investigate the hardness and elastic modulus of the Cu/Ta/SiO2/Si multilayer system.The hardness shows an apparent dependence on the film thickness,and decreases with the increase of film thickness,whereas the elastic modulus does not.To reveal the structural change,a trench through the center of a residual indent was cut by a focused ion beam,and then examined using an ion-microscope.TEM analysis showed that delamination occurs at the interface between the Ta and the SiO2 layer of the residual indent, suggesting that the destruction under a relatively large load is due to weak bonding.张昕 卢茜 吴子景 吴晓京 Shen Weidian 蒋宾 2012Journal of Semiconductors2012,33,4:0
7A J-INTEGRAL ANALYSIS OF CRACKS IN OVERMATCHED WELDED JOINTS显示文摘The effects of material inhomogeneity and weld width of the overmatched welded joints with alongitudinal crack or flaw upon the J-interal,a characterizing parameter for elastoplasticfracture,have been studied.The overmatched weld is idealized to be a parallelly cracked andsandwiched hard layer,the yieht stress of which is higher than that of the base metal.Numeri-cal solutions were obtained by using elastoplastic finite element method under the assumptionof plane stress.The resuits show that the values of J-integral are remarkably affected by thematerial inhomogeneity ant the weld width especially when the nominal stress or nominalstrain is comparatively high,which,therfore,should be taken into account when evaluatingthe crack driving force for an overmatched joint.MA Weidian Tsinghua University,Beijing,ChinaZHANG Shicheng TIAN Xitang Haribin Institute of Technology,Harbin,China Dept.of Mechanical Engineering,Tsinghua University,Beijing,China 1989Acta Metallurgica Sinica(English Letters)1989,2,7:0
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