维普期刊资源整合服务平台（V6.5）

维普中文期刊产品整合服务

2篇 您的检索式：作者名="WAN ShaoMing"

选中清除导出查看参考文献查看引证文献引用追踪共1页首页上一页第1页下一页末页 /1 跳转

		题名	作者	年代	出处	被引量
	1	CuInSe_2 thin films obtained by pulse-plating electrodeposition technique with novel pulse wave显示文摘CuInSe2 films were electrodeposited onto indium tin oxide(ITO) substrate in constant current mode using bell-like wave modulated square wave in aqueous solution.The films obtained at different pulse frequencies were characterized by scanning electron microscopy(SEM),X-ray energy dispersive spectroscopy(EDS) and X-ray diffraction(XRD).UV-Vis-NIR absorption spectro scopy was used to study the optical properties of these films.The results showed that the chalcopyrite phase CuInSe2 films with a smooth surface and stoichiometric composition could be obtained at appropriate pulse frequency.The crystallinity of CuInSe2 films could be further improved after annealing treatment.Despite this,we also found that the films obtained using the pulse-plating electrodeposition technique had a faster deposition rate and better film adhesion ability than that using the traditional CIS electrodeposition technique,which is significant to the low-cost CIS thin film solar cell production.	WANG XiaoLi WANG GuangJun TIAN BaoLi WAN ShaoMing DU ZuLiang	2010	Chinese Science Bulletin2010，55，18：	2
	2	Fabrication of metal oxide nanostructures based on Atomic Force Microscopy lithography显示文摘Atomic Force Microscopy (AFM) mechanical lithography is a simple but significant method for nanofabrication. In this work, we used this method to construct nanos- tructures on Pt/Cu bilayer metal electrodes under ambient conditions in air. The influence of various scratch parameters, such as the applied force, scan velocity and circle times, on the lithography patterns was investigated. The Pt-Cu-CuxO-Cu-Pt nanostructure was constructed by choosing suitable scratch parameters and oxidation at room temperature. The properties of the scratched regions were also investigated by friction force microscopy and conductive AFM (C-AFM). The I-V curves show symmetric and linear properties, and Ohmic contacts were formed. These results indicate that AFM mechanical lithography is a powerful tool for fabricating novel metal-semiconductor nanoelectronic devices.	ZHU XiaoYang CHENG Gang WANG ShuJie DAI ShuXi WAN ShaoMing ZHANG XingTang DU ZuLiang	2008	Science China(Physics,Mechanics & Astronomy)2008，51，10：	1

返回顶部每页显示：

共1页首页上一页第1页下一页末页 /1 跳转

goolge学术搜索-维普

网站首页 | 关于我们 | 联系我们 | 产品服务 | 客服中心 | 广告服务 | 版权声明 | 网站联盟 | 友情链接 | 售卡网点

版权所有© 渝B2-20050021-1　渝公网安备 50019002500403号　违法和不良信息举报中心

互联网出版许可证新出网证(渝)字10号全国400电话 - 免长途话费