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| 1 | Adhesion and friction performance of DLC/rubber:The influence of plasma pretreatment显示文摘Diamond-like carbon(DLC)films are deposited on rubber surfaces to protect the rubber components,and surface pretreatment of the rubber substrates prior to the film deposition can improve the adhesion between the DLC films and the rubber.Thus,the principal purpose of this work concentrates on determining the effects of argon(Ar),oxygen(O_(2)),nitrogen(N_(2)),and hydrogen(H_(2))plasma pretreatments on the adhesion and friction performance of the DLC films deposited on rubber(DLC/rubber).The results indicated that the Ar plasma pretreatment promoted the formation of a compact layer on the rubber surface.By contrast,massive fillers were exposed on the rubber surface after oxygen or nitrogen plasma pretreatments.Moreover,the typical micrometer-scale patches divided by random cracks were observed on the surface of DLC/rubber,except for the sample pretreated with oxygen plasma.The adhesion of DLC/rubber was found to strengthen with the removal of weak boundary layers and the generation of free radicals on the rubber surface after plasma pretreatment.The tribo-tests revealed that DLC/rubber with O_(2),N_(2),and H_(2) plasma pretreatments cannot achieve optimal friction performance.Significantly,DLC/rubber with Ar plasma pretreatment exhibited a low and stable friction coefficient of 0.19 and superior wear resistance,which was correlated to the high adhesion,good load-bearing of the rubber surface,and the approximate sine function of the surface profile of the DLC film. | Changning BAI Zhenbin GONG Lulu AN Li QIANG Junyan ZHANG Georgy YUSHKOV Alexey NIKOLAEV Maxim SHANDRIKOV Bin ZHANG | 2021 | Friction2021，9，3： | 2 |
| 2 | Effect of multiple current spikes on the enhancement of ion charge states of vacuum arc plasmas显示文摘 | Yushkov G Y Oks E M Anders A | 2000 | J Appl Phys2000，87，12： | 1 |
| 3 | Effect of residual gas on the ion charge distribution in vacuum arc discharge plasmas显示文摘 | A. G. Nikolaev E. M. Oks G. Yu. Yushkov | 1998 | Technical Physics1998，，9： | 1 |
| 4 | MOLCHA- NOV MTF formalism for measurement of spectral resolution of acousto-optical devices with synthesized transmission function 显示文摘 | KONSTANTIN B YUSHKOV VLADIMIR YA | 2013 | Optics Letters2013，38，18： | 1 |
| 5 | Improvement in performance of a TeO2 acousto-optic imaging spectrometer显示文摘 | V B Voloshinov K B Yushkov B B Linde | 2007 | J Opt A: Pure Appl Opt2007，9，4： | 1 |
| 6 | Improvement in performance of a TeO acousto-optic imaging spectrometer显示文摘 | V B Votoshinov K B Yushkov B B J Linde | 2007 | Journal of Optics A: Pure and Applied Optics2007，9，4： | 1 |
| 7 | Ion velocities in vacuum arc plasmas 显示文摘 | Yushkov G Y Anders A Oks E M | 2000 | Journal of Applied Physics2000，88，10： | 1 |
| 8 | Dynamic' properties of moderately concentrated magnetic liquids 显示文摘 | Zubarev A Yu Yushkov A V | 1998 | Journal of Experimental and Theoretical Physics1998，87，3： | 1 |
| 9 | Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field显示文摘 | ANDERS A YUSHKOV G Y | 2002 | Journal of Applied Physics2002，91，： | 1 |
| 10 | Measurement of total ion current from vacuum arc plasma sources显示文摘 | Oks E M Savkin K P Yushkov G Y | 2006 | Rev Sci Instrum2006，77，03： | 1 |
| 11 | Measurement of total ion current from vacuum arc plasma sources显示文摘 | OKS E M SAVKIN K P YUSHKOV G~ NIKOLAEV A G ANDERS A BROWN I G | 2006 | Review of Scientific Instruments2006，77，： | 1 |
| 12 | Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field显示文摘 | ANDERS A YUSHKOV G Y | 2002 | Journal of Applied Physics2002，91，8： | 1 |
| 13 | Ion velocities in vacuum arc plasmas显示文摘 | Yushkov G Y Anders A Oks E M | 2000 | J Appl Phys2000，88，10： | 1 |
| 14 | Magnetic- field-dependent plasma composition of a pulsed aluminum arc in an oxygen ambient显示文摘 | SCHNEIDER J M ANDERS A YUSHKOV G Y | 2001 | Applied Physics Letters2001，78，： | 1 |
| 15 | Ion flux from vacuum arc cathode spots in the absence and presence of a magnetic field显示文摘 | ANDERS A YUSHKOV G Y | 2002 | Journal of Applied Physics2002，91，8： | 1 |
| 16 | Formation of Multicharged Metal Ions in Vacuum Arc Plasma Heated by Gyrotron Radiation显示文摘A new method for the generation of high charged state metal ion beams is developed.This method is based on microwave heating of vacuum arc plasma in a magnetic trap under electroncyclotron resonance (ECR) conditions.Two gyrotrons for plasma heating were used,which werewith the following parameters.The first is with a wave frequency of 37.5 GHz,a pulse duration of1 ms and power of 100 kW,another is with 75 GHz,0.15 ms and 400 kW.Two different magnetictraps were considered for vacuum arc plasma confinement.The first one is a simple mirror trap.Such system was already investigated and could provide high charge state ions.The second trapwas with a cusp magnetic field configuration with native 'minimum-B' field structure.Twodifferent ways of metal plasma injection into the magnetic trap were used.The first one is anaxial injection from an arc source located out of the trap,and the second is a radial injection fromfour arc sources mounted at the center of the trap.Both traps provide up to 200 eMA of ion beamcurrent for platinum ions with highest charge state 10+.Ion beams were successfully extractedfrom the plasma and accelerated by a voltage of up to 20 kV. | G. Yu. YUSHKOV K. P. SAVKIN A. G. NIKOLAEV E. M. OKS A.V. VODOPYANOV I. V. IZOTOV D. A. MANSFELD | 2011 | Plasma Science and Technology2011，13，5： | 1 |
| 17 | Magnetic-field- dependent plasma composition of a pulsed aluminum arc in an oxygen ambient 显示文摘 | Schneider J M Anders A Yushkov Yu G | 2001 | Applied Physics Letters2001，78，： | 1 |
| 18 | Ion velocities in vacuum arc plasmas显示文摘 | Yushkov G Y Anders A Oks E M | 2000 | J Appl Phys2000，88，： | 1 |
| 19 | Mevva ion source operated in purely gaseous mode显示文摘 | Yushkov G Y MacGill R A Brown I G | 2004 | Review of Scientific Instruments2004，75，5： | 1 |
| 20 | Charge-state distribution of ions in a vacuum arc discharge plasma in a high magnetic field显示文摘 | A. G. Nikolaev E. M. Oks G. Yu. Yushkov | 1998 | Technical Physics1998，，5： | 1 |
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